MKS Instruments AX2000 Series overview
MKS Instruments AX2000 Series Microwave Plasma SubsystemIn remote microwave plasma subsystems, the plasma discharge is used to dissociate process gases and prod...
Manufactured byMKS Instruments
Part number or familyAX2000 Series
Product groupMicrowave Plasma Subsystems
Product details
Manufactured byMKS Instruments
Product groupMicrowave Plasma Subsystems
DescriptionMKS Instruments AX2000 Series Microwave Plasma SubsystemIn remote microwave plasma subsystems, the plasma discharge is used to dissociate process gases and produce active atoms (radicals) upstream of the process chamber. Remote microwave plasma subsystems produce a low content of energetic ions. Therefore, the flow of radicals generated in the microwave plasma source can be used for damage-free wafer processing.
Key FeaturesPhotoresist Removal Passivation & Residue Removal Surface Modification Nitridation Oxide Etch Deposition Silicon Etch Remote Chamber Clean
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Microwave Plasma Subsystems
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