Product details
Manufactured byENI
Product groupModules
DescriptionENI GHW-25 RF Plasma Generator
OverviewThe GHW-25 / GHW-50 Genesis Plasma Generator is a rugged RF power source for plasma etching, CVD and sputtering applications. Featuring precise power control and digital interfacing, this Genesis generator provides the exceptional reliability and repeatability required for today’s demanding plasma processes.Operating at the frequency of 27.12MHz, 13.56MHz or 40.68MHz, the GHW-25 / GHW-50 Genesis generator produces 2500W or 5000W of power into a 50Ω load. The DSP-based control module automatically measures forward RF power and reflected RF power, maintaining constant power output within ±1% of set point over a Dynamic Power Range of <0 to 3000 watts or 0 to 5000 watts.Precise power calibration is traceable to NIST (National Institute of Standards and Technology) through the ENI Power Standard. Low harmonic distortion and spurious-free performance complement the unit’s RF power output control and unconditional RF stability.A rugged RF power section ensures substantial power delivery into fixed match systems. The DSP-based control constantly monitors internal subsystem status to maximize system availability. Extensive built-in diagnostics and internal fail-safe memory simplify maintenance requirements and increase system uptime.A new 9-pin digital interface provides remote control, monitoring and diagnostic capability via the RS-232 serial link to a computer or host terminal. Optional custom interface cards are also available.
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Modules
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