Applied Materials VIISta 3000XP overview
Applied Materials VIISta 3000XP High-current Ion Implanter The VIISta 3000XP, built on the acclaimed Varian dual-magnet single-wafer architecture, delivers the ...
Manufactured byApplied Materials
Part number or familyVIISta 3000XP
Product groupHigh-current Ion Implanter
Product details
Manufactured byApplied Materials
Product groupHigh-current Ion Implanter
DescriptionApplied Materials VIISta 3000XP High-current Ion Implanter
OverviewThe VIISta 3000XP, built on the acclaimed Varian dual-magnet single-wafer architecture, delivers the angle precision required for advanced high-energy applications.Below the 65nm technology node, the limitations of conventional batch high-energy implanters lead to device performance issues in high-energy processes. Single-wafer architecture is required to achieve the precise angle control, dose control, and productivity demanded for high-volume manufacturing. The system has been developed to deliver superior performance in metal contamination, benefiting CMOS image sensor technology.The VIISta 3000XP is also ideally suited for medium-current back-up. The system features the same single-wafer end station, dosimetry system, and wafer positioning system as the market-leading medium-current VIISta 900XP.
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Applied Materials
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High-current Ion Implanter
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